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    • Reactive ion etching of lead zirconate titanate and ruthenium oxide thin films 

      Electrical and Computer Engineering; Materials Science and Engineering (MSE); Cedraeus Incorporated; Virginia Tech Intellectual Properties, Inc.; Sharp Kabushiki Kaisha; Desu, Seshu B.; Pan, Wei; Vijay, Dilip P. (United States Patent and Trademark Office, 1996-03-05)
      A method of reactive ion etching both a lead zirconate titanate ferroelectric dielectric and a RuO.sub.2 electrode, and a semiconductor device produced in accordance with such process. The dielectric and electrode are ...