Ion assisted deposition of multicomponent thin films
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A novel in-situ stress measurement technique to study the formation kinetics of multi component oxide thin films was developed and was applied to PbTiO3. Single phase PbTi 03 thin films were formed from the reaction between films in the deposited PbO ITi02 multilayer. The film stoichiometry was accurately controlled by depositing individual layers of the required thickness. Development of film stresses associated with the formation of the product layer at the PbO/Ti02 interface of the multilayers was used to monitor growth rate of the PbTiO3 layer. It was found that growth of the PbTiO3 phase obeyed the parabolic law and the effective activation energy was estimated to be 108 kJ/mole. It is believed that the mechanism of this reaction was dominated by grain boundary diffusion of the participating cations.
- Doctoral Dissertations