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dc.contributorVirginia Techen
dc.contributor.authorLi, C. C.en
dc.contributor.authorDesu, Seshu B.en
dc.date.accessioned2014-05-14T13:35:39Zen
dc.date.available2014-05-14T13:35:39Zen
dc.date.issued1996-01-01en
dc.identifier.citationLi, C. C.; Desu, S. B., "Processing of PbTiO3 thin films. III. Effects of ion bombardment," J. Vac. Sci. Technol. A 14, 13 (1996); http://dx.doi.org/10.1116/1.579910en
dc.identifier.issn0734-2101en
dc.identifier.urihttp://hdl.handle.net/10919/47989en
dc.description.abstractThe effects of ion bombardment on multicomponent oxides, such as PbTiO3, and multilayer systems have been extensively studied by an in situ stress measurement technique. Energetic ion bombardment was found to accelerate PbTiO3 formation. Both the annealing temperature and the time needed for completion of the reaction were reduced. The apparent activation energy responsible for stress relaxation was found to be 310 kJ/mole for ion-assisted deposition (IAD) films, which is 120 kJ/mole higher than that for non-IAD films. This was attributed to stress reduction in PbTiO3 thin films resulting from ion bombardment. In addition, effects of ion bombardment on the stress of as-deposited multilayers, on the stress development in multilayers during annealing, and on the structure-property-processing interrelationships were also investigated. (C) 1996 American Vacuum Society.en
dc.format.mimetypeapplication/pdfen
dc.language.isoen_USen
dc.publisherAmerican Institute of Physicsen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectCompressive-stressen
dc.subjectAssisted depositionen
dc.subjectMicrostructureen
dc.subjectEvaporationen
dc.subjectGrowthen
dc.subjectModelen
dc.subjectOriginen
dc.subjectMaterials science, coatings & filmsen
dc.subjectPhysics, applieden
dc.titleProcessing of PbTiO3 thin films. III. Effects of ion bombardmenten
dc.typeArticle - Refereeden
dc.contributor.departmentMaterials Science and Engineering (MSE)en
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvsta/14/1/10.1116/1.579910en
dc.date.accessed2014-05-09en
dc.title.serialJournal of Vacuum Science & Technology a-Vacuum Surfaces and Filmsen
dc.identifier.doihttps://doi.org/10.1116/1.579910en
dc.type.dcmitypeTexten


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