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dc.contributor.authorYesensky, Richard J.en_US
dc.date.accessioned2016-05-23T14:57:01Z
dc.date.available2016-05-23T14:57:01Z
dc.date.issued1979en_US
dc.identifier.urihttp://hdl.handle.net/10919/71004
dc.format.extentx, 157, [2] leavesen_US
dc.format.mimetypeapplication/pdfen_US
dc.language.isoen_USen_US
dc.publisherVirginia Polytechnic Institute and State Universityen_US
dc.rightsThis Item is protected by copyright and/or related rights. Some uses of this Item may be deemed fair and permitted by law even without permission from the rights holder(s), or the rights holder(s) may have licensed the work for use under certain conditions. For other uses you need to obtain permission from the rights holder(s).en_US
dc.subject.lccLD5655.V855 1979.Y484en_US
dc.subject.lcshThin filmsen_US
dc.subject.lcshX-ray microanalysisen_US
dc.titleThickness and strain determinations of thin film systems by x-ray analysisen_US
dc.typeThesisen_US
dc.contributor.departmentNuclear Science and Engineeringen_US
dc.description.degreeMaster of Scienceen_US
dc.identifier.oclc5431693en_US
thesis.degree.nameMaster of Scienceen_US
thesis.degree.levelmastersen_US
thesis.degree.grantorVirginia Polytechnic Institute and State Universityen_US
thesis.degree.disciplineNuclear Science and Engineeringen_US
dc.type.dcmitypeTexten_US


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