Now showing items 1-4 of 4

    • Apparatus for pyroelectric emission lithography using patterned emitter 

      SAMSUNG ELECTRONICS CO., LTD.; Virginia Tech Intellectual Properties, Inc.; Yoo, In-kyeong (United States Patent and Trademark Office, 2002-11-05)
      A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and ...
    • Endohedral metallofullerenes and method for making the same 

      Virginia Tech Intellectual Properties, Inc.; Dorn, Harry C.; Stevenson, Steven A. (United States Patent and Trademark Office, 2001-10-16)
      A family of trimetallic nitride endohedral metallofullerenes and their preparation are described. The trimetallic nitride endohedral metallofullerenes have the general formula A.sub.3-n X.sub.n @C.sub.m where n ranges from ...
    • Method and apparatus for emission lithography using patterned emitter 

      SAMSUNG ELECTRONICS CO., LTD.; Virginia Tech Intellectual Properties, Inc.; Yoo, In-kyeong (United States Patent and Trademark Office, 2004-05-25)
      A method and apparatus for emission lithography using a patterned emitter wherein, in the apparatus for emission lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. ...
    • Method and apparatus for pyroelectric lithography using patterned emitter 

      SAMSUNG ELECTRONICS CO., LTD.; Virginia Tech Intellectual Properties, Inc.; Yoo, In-kyeong (United States Patent and Trademark Office, 2003-05-20)
      A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and ...