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    • Production of films of SiO.sub.2 by chemical vapor deposition 

      Virginia Tech Intellectual Properties, Inc.; Desu, Seshu B.; Agaskar, Pradyot A.; Peng, Chia-Tien Shian; Shi, Tian (United States Patent and Trademark Office, 1997-01-14)
      The chemical vapor deposition of hydridospherosiloxane to generate films of SiO.sub.2 at low temperatures on substrates that cannot withstand high temperatures. The chemical vapor deposition process synthesized compounds ...