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Formation of poly(benzimidazole)
(United States Patent and Trademark Office, 1991-11-19)
A poly Ressert can be formed by first reacting benzimidazole with an aliphatic diacid chloride to form bisbenzimidazole and then reacting the bisbenzimidazole with an aliphatic diacid chloride and cyanide to form the poly ...
Mono- and di(functionally-substituted phenylene) semi-rigid crowns and precursors thereof
(United States Patent and Trademark Office, 1994-07-19)
Bis(carboalkoxy-substituted m-phenylene)-32-crown-10 compounds, useful as polymerizable monomers, can be formed in one step by reacting a functionalized dihydroxy aromatic compound with a dihalopolyether. In the same ...
Reversible, mechanically interlocked polymeric networks which self-assemble
(United States Patent and Trademark Office, 2000-08-08)
Polymeric structure involving a first polymer having a linear segment and a second polymer having a macrocyle which is threaded onto said linear segment to form a rotaxane complex. The rotaxane complex is capable of ...
Formation of reissert compound of benzoyl benzimidazole
(United States Patent and Trademark Office, 1991-03-19)
The Reissert compound of 1-benzoylbenzimidazole can be formed by reaction of an acid chloride (e.g., benzoyl chloride) and cyanide (e.g., trimethylsilyl cyanide) with benzoyl benzimidazole. It has the formula: ##STR1## and ...
Bis(functionally-substituted phenylene) semi-rigid crowns and process for making
(United States Patent and Trademark Office, 1991-07-02)
Bis(carboalkoxy-substituted phenylene)-32-crown-10 compounds, useful as polymerizable monomers, can be formed by first reacting a functionalized dihydroxy aromatic compound with a hydroxy protecting group-substituted ...
Formation of acyclic bis (reissert compounds)
(United States Patent and Trademark Office, 1991-02-26)
Bis Reissert compounds can be formed by reaction of a cyanohydrin, formed by reaction of an aldehyde and a diamine, with benzoyl chloride in the presence of an amine acid acceptor.
Polyamide containing reissert unit(s)
(United States Patent and Trademark Office, 1993-03-16)
Polyamide compositions containing Reissert units can be formed by the reaction of an open chain bis Reissert compound or a mono Reissert compound with a diamine and a diacid chloride.
Isoquinoline-containing poly(Reissert compounds)
(United States Patent and Trademark Office, 1993-03-02)
Poly (Reissert compounds) can be formed by reaction of a coupled bis(isoquinoline), e.g., a 4,4' -coupled bis(isoquinoline), a diacid chloride, e.g. adipoyl chloride, and a source of cyanide, e.g., trimethylsilyl cyanide.
Formation of Reissert compound of bisbenzimidazole
(United States Patent and Trademark Office, 1991-06-04)
A Reissert compound of bisbenzimidazole can be formed by first reacting benzimidazole with an aliphatic diacid chloride to form bisbenzimidazole and then reacting the bisbenzimidazole with an aliphatic acid chloride and ...
Dibenzo crown monomers and polymers formed therefrom
(United States Patent and Trademark Office, 1994-04-12)
Novel bis(extraannular functionally-substituted phenylene) crown compounds, useful as chelating agents or in the synthesis of condensation polymers containing large semi-rigid macrocycles in the polymer backbone, are ...