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dc.date.accessioned2016-08-24T17:54:29Zen
dc.date.available2016-08-24T17:54:29Zen
dc.date.issued2005-02-15en
dc.identifier.urihttp://hdl.handle.net/10919/72503en
dc.description.abstractA hydrogen permselective membrane, a method of forming a permselective membrane and an apparatus comprising a permselective membrane, a porous substrate and an optional intermediate layer are described. Using chemical vapor deposition (CVD) at low reactant gas concentration, high permselectivities are achieved with minimal reduction in hydrogen permeance.en
dc.format.mimetypeapplication/pdfen
dc.language.isoen_USen
dc.publisherUnited States Patent and Trademark Officeen
dc.titleHydrogen-selective silica-based membraneen
dc.typePatenten
dc.identifier.urlhttp://pimg-fpiw.uspto.gov/fdd/02/546/068/0.pdfen
dc.date.accessed2016-08-19en
dc.type.dcmitypeTexten
dc.contributor.assigneeConocoPhillips Companyen
dc.contributor.assigneeVirginia Polytechnic Institute and State Universityen
dc.contributor.inventorOyama, Shigeo Teden
dc.contributor.inventorJack, Doug S.en
dc.contributor.inventorZang, Lixiongen
dc.contributor.inventorLee, Doo-hwanen
dc.date.filed2002-06-04en
dc.identifier.applicationnumber10162058en
dc.subject.uspc210/490en
dc.subject.uspcother210/500.26en
dc.subject.uspcother427/255.11en
dc.subject.uspcother427/255.12en
dc.subject.uspcother95/55en
dc.subject.uspcother95/56en
dc.subject.uspcother96/4en
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dc.subject.cpcB01D71/02en
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dc.subject.cpcC01B2203/0485en
dc.subject.cpcC01B2203/0495en
dc.type.patenttypeutilityen
dc.identifier.patentnumber6854602en


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