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dc.contributor.authorYe, Zhou
dc.contributor.authorNain, Amrinder S.
dc.contributor.authorBehkam, Bahareh
dc.date.accessioned2017-05-01T06:42:18Z
dc.date.available2017-05-01T06:42:18Z
dc.date.issued2016-06-01
dc.identifierc6nr03323g.pdf
dc.identifierc6nr03323g1.pdf
dc.identifier.issn2040-3364
dc.identifier.urihttp://hdl.handle.net/10919/77564
dc.description.abstractFabrication of micro/nano-structures on irregularly shaped substrates and three-dimensional (3D) objects is of significant interest in diverse technological fields. However, it remains a formidable challenge thwarted by limited adaptability of the state-of-the-art nanolithography techniques for nanofabrication on non-planar surfaces. In this work, we introduce Spun-Wrapped Aligned Nanofiber (SWAN) lithography, a versatile, scalable, and cost-effective technique for fabrication of multiscale (nano to microscale) structures on 3D objects without restriction on substrate material and geometry. SWAN lithography combines precise deposition of polymeric nanofiber masks, in aligned single or multilayer configurations, with well-controlled solvent vapor treatment and etching processes to enable high throughput (>10−7 m2 s−1) and large-area fabrication of sub-50 nm to several micron features with high pattern fidelity. Using this technique, we demonstrate whole-surface nanopatterning of bulk and thin film surfaces of cubes, cylinders, and hyperbola-shaped objects that would be difficult, if not impossible to achieve with existing methods. We demonstrate that the fabricated feature size (b) scales with the fiber mask diameter (D) as b1.5 ∝ D. This scaling law is in excellent agreement with theoretical predictions using the Johnson, Kendall, and Roberts (JKR) contact theory, thus providing a rational design framework for fabrication of systems and devices that require precisely designed multiscale features.
dc.format.extent12780-12786
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherRoyal Society of Chemistry
dc.relation.ispartofRoyal Society of Chemistry Gold Open Access - 2016
dc.rightsCreative Commons Attribution-NonCommercial 3.0 Unporteden
dc.rights.urihttp://creativecommons.org/licenses/by-nc/3.0/en
dc.titleSpun-wrapped aligned nanofiber (SWAN) lithography for fabrication of micro/nano-structures on 3D objects
dc.typeArticle - Refereed
dc.rights.holderYe, Zhouen
dc.rights.holderNain, Amrinder S.en
dc.rights.holderBehkam, Baharehen
dc.contributor.departmentMechanical Engineeringen_US
dc.title.serialNanoscale
dc.identifier.doihttps://doi.org/10.1039/c6nr03323g
dc.identifier.volume8
dc.identifier.issue25
dc.type.dcmitypeText
dc.type.dcmitypeDataset
dc.identifier.eissn2040-3372


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Creative Commons Attribution-NonCommercial 3.0 Unported
License: Creative Commons Attribution-NonCommercial 3.0 Unported