Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites

Abstract

Nanocomposite thin films with low dielectric constants are made by the simultaneous deposition of an oxide dielectric and an organic polymer at near room temperatures. Suitable oxides include SiO2, and suitable organic polymers include poly(chloro-para-xylylene). The two dielectric materials, when deposited, form nanocomposites characterized by nanometer-sized domains of dielectric material. The nanocomposite thin films of this invention are useful as dielectric layers for interlevel dielectric (ILD) and intermetal dielectric (IMD) dielectrics in the manufacture of semiconductor devices as well as for thin films for flat panel displays, food wraps, hybrid ceramics, glass, hard disk drives, and optical disk drives. Additionally, the invention comprises semiconductor devices and semiconductor chips made incorporating nanocomposites deposited by chemical vapor deposition.