Temperature-dependent internal friction in silicon nanoelectromechanical systems

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Date

2000-10-01

Journal Title

Journal ISSN

Volume Title

Publisher

AIP Publishing

Abstract

We report the temperature-dependent mechanical properties of nanofabricated silicon resonators operating in the megahertz range. Reduction of temperature leads to an increase of the resonant frequencies of up to 6.5%. Quality factors as high as 1000 and 2500 are observed at room temperature in metallized and nonmetallized devices, respectively. Although device metallization increases the overall level of dissipation, internal friction peaks are observed in all devices in the T=160-180 K range. (C) 2000 American Institute of Physics. [S0003-6951(00)01541-2].

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Keywords

Single-crystal silicon, Films

Citation

Evoy, S; Olkhovets, A; Sekaric, L; et al., "Temperature-dependent internal friction in silicon nanoelectromechanical systems," Appl. Phys. Lett. 77, 2397 (2000); http://dx.doi.org/10.1063/1.1316071