Scott, E. A.Singh, M. K.Barber, J. P.Rost, Christina M.Ivanov, S.Watt, J.Pete, D.Sharma, P.Lu, T. M.Harris, C. T.2024-01-222024-01-222022-11-140003-6951https://hdl.handle.net/10919/117511Vanadium oxide films are widely employed as thermal detectors in uncooled infrared detection systems due to their high temperature coefficient of resistance near room temperature. One strategy toward maximizing detectivity and reducing the thermal time constant in these systems is to minimize the system platform dimensions. This approach necessitates thinner film thicknesses (≪100 nm), for which there is little information regarding thermal sensing performance. Herein, we report on the sensitivity of reactively sputtered vanadium oxide thin film resistive thermometers nominally ranging from 100 to 25 nm and assess the influence of thermal annealing. We demonstrate that films in this minimum limit of thickness maintain a high temperature coefficient while additionally providing an enhancement in characteristics of the noise equivalent power.application/pdfenPublic Domain (U.S.)Article - Refereedhttps://doi.org/10.1063/5.012330312120Rost, Christina [0000-0002-6153-6066]1077-3118