Scholarly Works, Materials Science and Engineering (MSE)

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https://hdl.handle.net/10919/24370
Research articles, presentations, and other scholarship

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Browsing Scholarly Works, Materials Science and Engineering (MSE) by Subject "257/E21.252"

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    Reactive ion etching of lead zirconate titanate and ruthenium oxide thin films
    (United States Patent and Trademark Office, 1996-03-05)
    A method of reactive ion etching both a lead zirconate titanate ferroelectric dielectric and a RuO.sub.2 electrode, and a semiconductor device produced in accordance with such process. The dielectric and electrode are etched in an etching gas of O.sub.2 mixed with either CClF.sub.2 or CHClFCF.sub.3.