Finite Element Modeling of Electrochemical Polishing of Niobium in Hydrofluoric-Sulfuric Acid Electrolyte

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dc.contributor.authorWang, Kaiwenen
dc.contributor.authorCai, Wenjunen
dc.contributor.authorTian, Huien
dc.contributor.authorReece, Charles E.en
dc.date.accessioned2022-12-16T14:00:55Zen
dc.date.available2022-12-16T14:00:55Zen
dc.date.issued2022-06en
dc.description.abstractNiobium (Nb) used in superconducting radio-frequency cavities requires smooth surface to achieve optimal performance. In this work, a finite element model that coupled electrochemistry, heat transfer, and fluid dynamics was developed to investigate the electrochemical polishing mechanisms of Nb, using experimentally measured polarization results of coupon samples as validations. The current and potential distribution, oxide growth kinetics of Nb in a complex cavity geometry was investigated as a function of temperature and coolant flow. A low temperature coolant with intermediate flow rate was found to reduce surface current and ensure oxide uniformity. These results could shed light on the design of future particle accelerators. (C) 2022 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.en
dc.description.notesThis research was financially supported by the US Department of Energy Thomas Jefferson National Accelerator Facility. This material is based upon work supported by the U.S. Department of Energy, Office of Science, Office of Nuclear Physics under contract DE-AC05-06OR23177. The computational resource used in this work is provided by the advanced research computing (ARC) at Virginia Polytechnic Institute and State University. KW greatly appreciated help and advice from Gary Chen, Jim Henry, Anne Marie Valente, and Subashini De Silva from Jefferson Lab for discussion of the results.; Notice: This manuscript has been authored by Jefferson Science Associates, LLC under Contract No. DE-AC05-06OR23177 with the U.S. Department of Energy. The United States Government retains and the publisher, by accepting the article for publication, acknowledges that the United States Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this manuscript, or allow others to do so, for United States Government purposes.en
dc.description.sponsorshipUS Department of Energy Thomas Jefferson National Accelerator Facility; U.S. Department of Energy, Office of Science, Office of Nuclear Physics [DE-AC05-06OR23177]; U.S. Department of Energy [DE-AC05-06OR23177]en
dc.description.versionPublished versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.doihttps://doi.org/10.1149/1945-7111/ac7354en
dc.identifier.eissn1945-7111en
dc.identifier.issn0013-4651en
dc.identifier.issue6en
dc.identifier.other63507en
dc.identifier.urihttp://hdl.handle.net/10919/112922en
dc.identifier.volume169en
dc.language.isoenen
dc.publisherElectrochemical Soc Incen
dc.rightsPublic Domain (U.S.)en
dc.rights.urihttp://creativecommons.org/publicdomain/mark/1.0/en
dc.subjectmorphologyen
dc.subjectmechanismen
dc.subjectfilmsen
dc.titleFinite Element Modeling of Electrochemical Polishing of Niobium in Hydrofluoric-Sulfuric Acid Electrolyteen
dc.title.serialJournal of the Electrochemical Societyen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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