Method and apparatus for pyroelectric lithography using patterned emitter

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dc.contributor.assigneeSAMSUNG ELECTRONICS CO., LTD.en
dc.contributor.assigneeVirginia Tech Intellectual Properties, Inc.en
dc.contributor.inventorYoo, In-kyeongen
dc.date.accessed2016-08-19en
dc.date.accessioned2016-08-24T17:54:22Zen
dc.date.available2016-08-24T17:54:22Zen
dc.date.filed2002-08-29en
dc.date.issued2003-05-20en
dc.description.abstractA method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet or a projection system, thereby achieving exact a one-to-one projection or a x-to-one projection of the desired pattern etched on the substrate.en
dc.format.mimetypeapplication/pdfen
dc.identifier.applicationnumber10230315en
dc.identifier.patentnumber6566666en
dc.identifier.urihttp://hdl.handle.net/10919/72469en
dc.identifier.urlhttp://pimg-fpiw.uspto.gov/fdd/66/666/065/0.pdfen
dc.language.isoen_USen
dc.publisherUnited States Patent and Trademark Officeen
dc.subject.cpcB82Y10/00en
dc.subject.cpcB82Y40/00en
dc.subject.cpcH01J37/3175en
dc.subject.cpcH01J2237/31777en
dc.subject.uspc250/492.24en
dc.subject.uspcother250/492.2en
dc.titleMethod and apparatus for pyroelectric lithography using patterned emitteren
dc.typePatenten
dc.type.dcmitypeTexten
dc.type.patenttypeutilityen

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