Phosphorus containing poly(arylene ether)s useful as oxygen plasma resistant films and in nonlinear optical applications

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dc.contributor.assigneeCenter for Innovative Technologyen
dc.contributor.assigneeVirginia Polytechnic Institute and State Universityen
dc.contributor.assigneeVirginia Tech Intellectual Properties, Inc.en
dc.contributor.inventorPriddy, Jr., Duane B.en
dc.contributor.inventorPickering, Timothy L.en
dc.contributor.inventorMcGrath, James E.en
dc.contributor.inventorSmith, Carrington D.en
dc.date.accessed2016-08-19en
dc.date.accessioned2016-08-24T17:55:41Zen
dc.date.available2016-08-24T17:55:41Zen
dc.date.filed1993-07-30en
dc.date.issued1995-02-07en
dc.description.abstractPolymers containing the phosphine oxide moiety are identified as being particularly useful in applications where resistance to atomic oxygen etching is required and in applications where second order nonlinear optical effects will be utilized. Particularly preferred polymers for these two applications include poly(arylene ether phosphine oxide)s (PEPOS), and novel PEPOS which include phenolphthalein sub-units and derivatives thereof have been prepared.en
dc.format.mimetypeapplication/pdfen
dc.identifier.applicationnumber8099993en
dc.identifier.patentnumber5387629en
dc.identifier.urihttp://hdl.handle.net/10919/72828en
dc.identifier.urlhttp://pimg-fpiw.uspto.gov/fdd/29/876/053/0.pdfen
dc.language.isoen_USen
dc.publisherUnited States Patent and Trademark Officeen
dc.subject.cpcC08G79/04en
dc.subject.cpcC08K5/23en
dc.subject.cpcC08L85/02en
dc.subject.uspc430/141en
dc.subject.uspcother524/190en
dc.titlePhosphorus containing poly(arylene ether)s useful as oxygen plasma resistant films and in nonlinear optical applicationsen
dc.typePatenten
dc.type.dcmitypeTexten
dc.type.patenttypeutilityen

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