Hydrogen-selective silica-based membrane

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dc.contributor.assigneeConocoPhillips Companyen
dc.contributor.assigneeVirginia Polytechnic Institute and State Universityen
dc.contributor.inventorOyama, Shigeo Teden
dc.contributor.inventorJack, Doug S.en
dc.contributor.inventorZang, Lixiongen
dc.contributor.inventorLee, Doo-hwanen
dc.date.accessed2016-08-19en
dc.date.accessioned2016-08-24T17:54:29Zen
dc.date.available2016-08-24T17:54:29Zen
dc.date.filed2002-06-04en
dc.date.issued2005-02-15en
dc.description.abstractA hydrogen permselective membrane, a method of forming a permselective membrane and an apparatus comprising a permselective membrane, a porous substrate and an optional intermediate layer are described. Using chemical vapor deposition (CVD) at low reactant gas concentration, high permselectivities are achieved with minimal reduction in hydrogen permeance.en
dc.format.mimetypeapplication/pdfen
dc.identifier.applicationnumber10162058en
dc.identifier.patentnumber6854602en
dc.identifier.urihttp://hdl.handle.net/10919/72503en
dc.identifier.urlhttp://pimg-fpiw.uspto.gov/fdd/02/546/068/0.pdfen
dc.language.isoen_USen
dc.publisherUnited States Patent and Trademark Officeen
dc.subject.cpcB01D67/0072en
dc.subject.cpcB01D53/228en
dc.subject.cpcB01D69/10en
dc.subject.cpcB01D69/12en
dc.subject.cpcB01D71/02en
dc.subject.cpcB01D71/024en
dc.subject.cpcB01D71/025en
dc.subject.cpcB01D71/027en
dc.subject.cpcB01D71/028en
dc.subject.cpcB01D2325/022en
dc.subject.cpcB01D2325/22en
dc.subject.cpcC01B3/503en
dc.subject.cpcC01B2203/041en
dc.subject.cpcC01B2203/0465en
dc.subject.cpcC01B2203/047en
dc.subject.cpcC01B2203/0475en
dc.subject.cpcC01B2203/048en
dc.subject.cpcC01B2203/0485en
dc.subject.cpcC01B2203/0495en
dc.subject.uspc210/490en
dc.subject.uspcother210/500.26en
dc.subject.uspcother427/255.11en
dc.subject.uspcother427/255.12en
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dc.subject.uspcother96/4en
dc.subject.uspcother96/10en
dc.subject.uspcother96/11en
dc.titleHydrogen-selective silica-based membraneen
dc.typePatenten
dc.type.dcmitypeTexten
dc.type.patenttypeutilityen

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