Dynamics of the 5-EV optical-absorption in SIO2 glass
dc.contributor | Virginia Tech | en |
dc.contributor.author | Tsai, T. E. | en |
dc.contributor.author | Jewell, J. M. | en |
dc.contributor.author | Sanghera, J. S. | en |
dc.contributor.department | Electrical and Computer Engineering | en |
dc.contributor.department | Fiber & ElectroOptics Research Center (FEORC) | en |
dc.date.accessed | 2014-03-27 | en |
dc.date.accessioned | 2014-04-16T14:16:40Z | en |
dc.date.available | 2014-04-16T14:16:40Z | en |
dc.date.issued | 1993-06-01 | en |
dc.description.abstract | The optical absorption at 5 eV in SiO2 glass was observed, using laser calorimetry, to change reversibly depending on the intensity of UV light. The generation and bleaching of an absorption band at 5 eV by two- and one-photon absorption processes, respectively, can explain these reversible changes. This observation supports the structural model of unrelaxed oxygen deficiency center for the 5 eV absorption band in silica. | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Tsai, TE; Jewell, JM; Sanghera, JS, "Dynamics of the 5-EV optical-absorption in SIO2 glass," Appl. Phys. Lett. 62, 3396 (1993); http://dx.doi.org/10.1063/1.109028 | en |
dc.identifier.doi | https://doi.org/10.1063/1.109028 | en |
dc.identifier.issn | 0003-6951 | en |
dc.identifier.uri | http://hdl.handle.net/10919/47375 | en |
dc.identifier.url | http://scitation.aip.org/content/aip/journal/apl/62/26/10.1063/1.109028 | en |
dc.language.iso | en | en |
dc.publisher | AIP Publishing | en |
dc.rights | In Copyright | en |
dc.rights.uri | http://rightsstatements.org/vocab/InC/1.0/ | en |
dc.subject | Synthetic silica glass | en |
dc.subject | Defects | en |
dc.subject | Oxygen | en |
dc.subject | Mechanisms | en |
dc.subject | Bands | en |
dc.title | Dynamics of the 5-EV optical-absorption in SIO2 glass | en |
dc.title.serial | Applied Physics Letters | en |
dc.type | Article - Refereed | en |
dc.type.dcmitype | Text | en |
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