Oriented growth of SrBi2Ta2O9 ferroelectric thin films
dc.contributor | Virginia Tech | en |
dc.contributor.author | Desu, Seshu B. | en |
dc.contributor.author | Vijay, Dilip P. | en |
dc.contributor.author | Zhang, X. | en |
dc.contributor.author | He, B. P. | en |
dc.contributor.department | Materials Science and Engineering (MSE) | en |
dc.date.accessed | 2014-03-27 | en |
dc.date.accessioned | 2014-04-16T14:16:45Z | en |
dc.date.available | 2014-04-16T14:16:45Z | en |
dc.date.issued | 1996-09-01 | en |
dc.description.abstract | We report on the ferroelectric properties of c-axis oriented ferroelectric SrBi2Ta2O9 thin films. Pt/SrBi2Ta2O9/Pt capacitors were grown on single crystal MgO (and/or SrTiO3) substrates using pulsed laser ablation. These substrates provide the necessary template for (100) texture in platinum due to their close lattice matching. This in turn facilitates the c-axis orientation in the ferroelectric films. The degree of orientation in the layered structure ferroelectric film was systematically varied from highly c-axis oriented to random polycrystalline by varying the growth conditions of the bottom metal electrode. The polarization and coercive field values were found to decrease with an increasing degree of c-axis orientation; while the randomly oriented films exhibited a remnant polarization of 5 mu C/cm(2), a coercive field of 70 kV/cm, and a dielectric constant of 320, the c-axis oriented films exhibited very low polarization (similar to 1 mu C/cm(2)), coercivity (22 kV/cm), and dielectric constant (similar to 200) values. (C) 1996 American Institute of Physics. | en |
dc.description.sponsorship | Sharp Corporation Japan | en |
dc.description.sponsorship | CERAM-VA | en |
dc.description.sponsorship | CIT-VA | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.citation | Desu, SB; Vijay, DP; Zhang, X; et al., "Oriented growth of SrBi2Ta2O9 ferroelectric thin films," Appl. Phys. Lett. 69, 1719 (1996); http://dx.doi.org/10.1063/1.118008 | en |
dc.identifier.doi | https://doi.org/10.1063/1.118008 | en |
dc.identifier.issn | 0003-6951 | en |
dc.identifier.uri | http://hdl.handle.net/10919/47399 | en |
dc.identifier.url | http://scitation.aip.org/content/aip/journal/apl/69/12/10.1063/1.118008 | en |
dc.language.iso | en_US | en |
dc.publisher | AIP Publishing | en |
dc.rights | In Copyright | en |
dc.rights.uri | http://rightsstatements.org/vocab/InC/1.0/ | en |
dc.subject | Ferroelectric thin films | en |
dc.subject | Thin film growth | en |
dc.subject | Coercive force | en |
dc.subject | Polarization | en |
dc.subject | Thin films | en |
dc.title | Oriented growth of SrBi2Ta2O9 ferroelectric thin films | en |
dc.title.serial | Applied Physics Letters | en |
dc.type | Article - Refereed | en |
dc.type.dcmitype | Text | en |
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