X‐ray diffuse scattering from a nitrogen‐implanted niobium film

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dc.contributorVirginia Tech. Department of Materials Engineeringen
dc.contributorNaval Research Laboratory (U.S.)en
dc.contributorOak Ridge National Laboratoryen
dc.contributor.authorRao, Satish I.en
dc.contributor.authorHouska, Charles R.en
dc.contributor.authorGrabowski, Kennethen
dc.contributor.authorIce, Gene E.en
dc.contributor.authorSparks, C. J.en
dc.contributor.departmentMaterials Science and Engineering (MSE)en
dc.date.accessed2015-04-24en
dc.date.accessioned2015-05-21T19:47:21Zen
dc.date.available2015-05-21T19:47:21Zen
dc.date.issued1991-06-15en
dc.description.abstractA 2500-angstrom niobium single-crystal film was deposited onto a sapphire substrate and subsequently implanted with nitrogen to an average concentration of 0.5 at. %. Synchrotron radiation was used to measure the difference between the implanted and an unimplanted film to isolate the diffuse scattering from the implanted film near two Bragg reflections. This diffuse intensity arises mainly from elastic displacement fields about radiation-damage-related loops located on (211) planes. A small contribution of the scattering is calculated from the displacements about single interstitial nitrogen in octahedral sites. The Burgers vector of the loops is along the [111BAR] direction and makes an angle of 62-degrees with the loop plane giving a dominant shear component. Vacancy loops have a radius approximately 5 angstrom while interstitials are somewhat larger ranging from 10 to 15 angstrom. The number of vacancies and interstitials are nearly the same.en
dc.description.sponsorshipUnited States. Office of Naval Research - Grant No. N00014-83-K-0750, P0004en
dc.description.sponsorshipUnited States. Department of Energy. Division of Materials Sciences and Division of Chemical Sciencesen
dc.description.sponsorshipMartin Marietta Energy Systems, Inc. - Contract No. DE-AC05-840R21400en
dc.format.extent8 pagesen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationRao, S. I., Houska, C. R., Grabowski, K., Ice, G., Sparks, C. J. (1991). X‐ray diffuse scattering from a nitrogen‐implanted niobium film. Journal of Applied Physics, 69(12), 8104-8110. doi: 10.1063/1.347460en
dc.identifier.doihttps://doi.org/10.1063/1.347460en
dc.identifier.issn0021-8979en
dc.identifier.urihttp://hdl.handle.net/10919/52410en
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/69/12/10.1063/1.347460en
dc.language.isoen_USen
dc.publisherAmerican Institute of Physicsen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectThin filmsen
dc.subjectNiobiumen
dc.subjectVacanciesen
dc.subjectDislocationsen
dc.subjectElasticityen
dc.titleX‐ray diffuse scattering from a nitrogen‐implanted niobium filmen
dc.title.serialJournal of Applied Physicsen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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