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X‐ray diffraction analysis of concentration and residual stress gradients in nitrogen‐implanted niobium and molybdenum

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dc.contributorVirginia Tech. Department of Materials Engineeringen
dc.contributorNaval Research Laboratory (U.S.)en
dc.contributor.authorRao, Satish I.en
dc.contributor.authorHe, Baopingen
dc.contributor.authorHouska, Charles R.en
dc.contributor.authorGrabowski, Kennethen
dc.contributor.departmentMaterials Science and Engineering (MSE)en
dc.date.accessed2015-04-24en
dc.date.accessioned2015-05-21T19:47:21Zen
dc.date.available2015-05-21T19:47:21Zen
dc.date.issued1991-06-15en
dc.description.abstractLarge biaxial residual strains are developed after a 5-at.% implantation of N into Nb and Mo. The results indicate that the dominant source of internal strain arises from N located in interstitial sites. For Nb implanted at liquid-nitrogen temperature, the N atoms are located in octahedral sites. However, the data allow for some clustering as di- or tri-interstitials at the highest concentration (approximately 5 at. % N). Radiation damage is present as small vacancy and interstitial loops. Since vacancies and self-interstitials are present in nearly equal concentrations, the overall bulk dilatation cancels. However, because of their small size, a lesser core expansion has been included as a correction to the overall residual strain. Although one can obtain an estimate of the N distribution from TRIM, a more accurate description must include the distribution of knock-on energy. The latter has an important influence on the redistribution of N relative to that predicted by TRIM. Both host lattices (Nb and Mo) behave like "rigid containers" in directions parallel to the free surface and give a magnified elastic response normal to the free surface.en
dc.description.sponsorshipUnited States. Office of Naval Research - Grant Number N0004-83-K-0750, P00004en
dc.format.extent9 pagesen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationRao, S. I., He, B. P., Houska, C. R., Grabowski, K. (1991). X‐ray diffraction analysis of concentration and residual stress gradients in nitrogen‐implanted niobium and molybdenum. Journal of Applied Physics, 69(12), 8111-8118. doi: 10.1063/1.347461en
dc.identifier.doihttps://doi.org/10.1063/1.347461en
dc.identifier.issn0021-8979en
dc.identifier.urihttp://hdl.handle.net/10919/52408en
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/69/12/10.1063/1.347461en
dc.language.isoen_USen
dc.publisherAmerican Institute of Physicsen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectNiobiumen
dc.subjectMolybdenumen
dc.subjectFree surfacesen
dc.subjectInterstitial defectsen
dc.subjectVacanciesen
dc.titleX‐ray diffraction analysis of concentration and residual stress gradients in nitrogen‐implanted niobium and molybdenumen
dc.title.serialJournal of Applied Physicsen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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