Laser-assisted low temperature processing of Pb(Zr, Ti)O-3 thin film

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dc.contributorVirginia Techen
dc.contributor.authorZhu, Y. F.en
dc.contributor.authorZhu, J. S.en
dc.contributor.authorSong, Yoon J.en
dc.contributor.authorDesu, Seshu B.en
dc.contributor.departmentMaterials Science and Engineering (MSE)en
dc.date.accessed2014-01-24en
dc.date.accessioned2014-02-03T15:57:17Zen
dc.date.available2014-02-03T15:57:17Zen
dc.date.issued1998-10-01en
dc.description.abstractA method for lowering the processing temperature of PbZr1-xTixO3 films was developed utilizing a laser- assisted two- step process. In the first step, perovskite phase was initiated in the PZT films to a furnace anneal at low temperatures in the range of 470-550 degrees C, depending on the Zr/Ti ratio. Later, the films were laser annealed (using KrF excimer laser) at room temperature to grow the perovskite phase, and to improve microstructure and ferroelectric properties. It was found that this two-step process was very effective in producing excellent quality ferroelectric PZT films at low temperatures. It should be noted that although laser annealing of amorphous and/or pyrochlore films directly (one-step process) produced perovskite phase, the ferroelectric properties of these films, irrespective of the composition, were rather unattractive. Some possible reasons for the ineffectiveness of the one-step process were discussed. (C) 1998 American Institute of Physics. [S0003-6951(98)02640-0].en
dc.format.mimetypeapplication/pdfen
dc.identifier.citationZhu, YF; Zhu, JS; Song, YJ; et al., "Laser-assisted low temperature processing of Pb(Zr, Ti)O-3 thin film," Appl. Phys. Lett. 73, 1958 (1998); http://dx.doi.org/10.1063/1.122334en
dc.identifier.doihttps://doi.org/10.1063/1.122334en
dc.identifier.issn0003-6951en
dc.identifier.urihttp://hdl.handle.net/10919/25262en
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/73/14/10.1063/1.122334en
dc.language.isoen_USen
dc.publisherAIP Publishingen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectKRF excimer-laseren
dc.subjectPolycrystalline siliconen
dc.subjectCrystallizationen
dc.subjectPhysicsen
dc.titleLaser-assisted low temperature processing of Pb(Zr, Ti)O-3 thin filmen
dc.title.serialApplied Physics Lettersen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten
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