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Processing of PbTiO3 thin films. II. in situ investigation of stress relaxation

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dc.contributorVirginia Techen
dc.contributor.authorLi, C. C.en
dc.contributor.authorDesu, Seshu B.en
dc.contributor.departmentMaterials Science and Engineering (MSE)en
dc.date.accessed2014-05-09en
dc.date.accessioned2014-05-14T13:35:39Zen
dc.date.available2014-05-14T13:35:39Zen
dc.date.issued1996-01-01en
dc.description.abstractStress relaxation in PbTiO3 films was investigated by the in situ stress measurement technique. A simple viscous flow model was successfully used to interpret the kinetics and behavior of stress relaxation of PbTiO3 thin films. The activation energy responsible for stress relaxation was estimated to be 190 kJ/mole, which was accounted for by the lattice diffusion of vacancies. A Nabarro-Herring creep model was successfully employed to correlate the relationships among the viscosity, lattice diffusion coefficient, and grain size of the PbTiO3 films, and an estimate of the lattice diffusion coefficient of vacancy motion during relaxation was obtained. Also, the observed time required for complete relaxation was found to be in accord with theoretical values. Hillock formation resulting from grain boundary sliding is believed to contribute to stress relaxation in its early stage. Thereafter, grain growth resulting from lattice diffusion is believed to play a major role in the stress relaxation. (C) 1996 American Vacuum Society.en
dc.description.sponsorshipDefense Advanced Research Agency (DARPA) through a project from the Office of Naval Researchen
dc.description.sponsorshipCenter for Advanced Ceramic Materials at Virginia Techen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationLi, C. C.; Desu, S. B., "Processing of PbTiO3 thin films. II. In situ investigation of stress relaxation," J. Vac. Sci. Technol. A 14, 7 (1996); http://dx.doi.org/10.1116/1.579883en
dc.identifier.doihttps://doi.org/10.1116/1.579883en
dc.identifier.issn0734-2101en
dc.identifier.urihttp://hdl.handle.net/10919/47988en
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvsta/14/1/10.1116/1.579883en
dc.language.isoen_USen
dc.publisherAmerican Institute of Physicsen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectAluminum filmsen
dc.subjectHillock formationen
dc.subjectGrowthen
dc.subjectMaterials science, coatings & filmsen
dc.subjectPhysics, applieden
dc.titleProcessing of PbTiO3 thin films. II. in situ investigation of stress relaxationen
dc.title.serialJournal of Vacuum Science & Technology a-Vacuum Surfaces and Filmsen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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