Ion assisted deposition of multicomponent thin films
dc.contributor.author | Li, Chen-Chung | en |
dc.contributor.committeechair | Desu, Seshu B. | en |
dc.contributor.committeemember | Dillard, John G. | en |
dc.contributor.committeemember | Hendricks, Robert W. | en |
dc.contributor.committeemember | Cox, David | en |
dc.contributor.committeemember | Reynolds, William T. Jr. | en |
dc.contributor.department | Materials Engineering Science | en |
dc.date.accessioned | 2014-03-14T21:21:50Z | en |
dc.date.adate | 2005-10-20 | en |
dc.date.available | 2014-03-14T21:21:50Z | en |
dc.date.issued | 1994-01-15 | en |
dc.date.rdate | 2005-10-20 | en |
dc.date.sdate | 2005-10-20 | en |
dc.description.abstract | A novel in-situ stress measurement technique to study the formation kinetics of multi component oxide thin films was developed and was applied to PbTiO₃. Single phase PbTi 0₃ thin films were formed from the reaction between films in the deposited PbO ITi0₂ multilayer. The film stoichiometry was accurately controlled by depositing individual layers of the required thickness. Development of film stresses associated with the formation of the product layer at the PbO/Ti0₂ interface of the multilayers was used to monitor growth rate of the PbTiO₃ layer. It was found that growth of the PbTiO₃ phase obeyed the parabolic law and the effective activation energy was estimated to be 108 kJ/mole. It is believed that the mechanism of this reaction was dominated by grain boundary diffusion of the participating cations. | en |
dc.description.degree | Ph. D. | en |
dc.format.extent | xii, 124 leaves | en |
dc.format.medium | BTD | en |
dc.format.mimetype | application/pdf | en |
dc.identifier.other | etd-10202005-102831 | en |
dc.identifier.sourceurl | http://scholar.lib.vt.edu/theses/available/etd-10202005-102831/ | en |
dc.identifier.uri | http://hdl.handle.net/10919/40039 | en |
dc.language.iso | en | en |
dc.publisher | Virginia Tech | en |
dc.relation.haspart | LD5655.V856_1994.L5.pdf | en |
dc.relation.isformatof | OCLC# 30888329 | en |
dc.rights | In Copyright | en |
dc.rights.uri | http://rightsstatements.org/vocab/InC/1.0/ | en |
dc.subject.lcc | LD5655.V856 1994.L5 | en |
dc.subject.lcsh | Thin films | en |
dc.title | Ion assisted deposition of multicomponent thin films | en |
dc.type | Dissertation | en |
dc.type.dcmitype | Text | en |
thesis.degree.discipline | Materials Engineering Science | en |
thesis.degree.grantor | Virginia Polytechnic Institute and State University | en |
thesis.degree.level | doctoral | en |
thesis.degree.name | Ph. D. | en |
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