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Polyamide containing reissert unit(s)

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5194575.pdf (379.47 KB)
Downloads: 190

TR Number

Date

1993-03-16

Authors

Journal Title

Journal ISSN

Volume Title

Publisher

United States Patent and Trademark Office

Abstract

Polyamide compositions containing Reissert units can be formed by the reaction of an open chain bis Reissert compound or a mono Reissert compound with a diamine and a diacid chloride.

Description

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Citation

Persistent link

http://hdl.handle.net/10919/72796

Collections

Virginia Tech Patents