Polyamide containing reissert unit(s)

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dc.contributor.assigneeVirginia Tech Intellectual Properties, Inc.en
dc.contributor.inventorGibson, Harry W.en
dc.contributor.inventorJois, Yajnanarayana H.en
dc.date.accessed2016-08-19en
dc.date.accessioned2016-08-24T17:55:34Zen
dc.date.available2016-08-24T17:55:34Zen
dc.date.filed1991-04-22en
dc.date.issued1993-03-16en
dc.description.abstractPolyamide compositions containing Reissert units can be formed by the reaction of an open chain bis Reissert compound or a mono Reissert compound with a diamine and a diacid chloride.en
dc.format.mimetypeapplication/pdfen
dc.identifier.applicationnumber7689418en
dc.identifier.patentnumber5194575en
dc.identifier.urihttp://hdl.handle.net/10919/72796en
dc.identifier.urlhttp://pimg-fpiw.uspto.gov/fdd/75/945/051/0.pdfen
dc.language.isoen_USen
dc.publisherUnited States Patent and Trademark Officeen
dc.subject.cpcC08G69/00en
dc.subject.cpcC08G69/48en
dc.subject.uspc525/420en
dc.subject.uspcother528/328en
dc.subject.uspcother528/329.1en
dc.titlePolyamide containing reissert unit(s)en
dc.typePatenten
dc.type.dcmitypeTexten
dc.type.patenttypeutilityen

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