Dry etching processes for ferroelectric capacitors

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dc.contributor.authorPan, Weien
dc.contributor.departmentMaterials Engineering Scienceen
dc.date.accessioned2023-04-07T05:17:04Zen
dc.date.available2023-04-07T05:17:04Zen
dc.date.issued1995en
dc.description.degreePh.D.en
dc.format.extentxv, 167 leavesen
dc.format.mimetypeapplication/pdfen
dc.identifier.urihttp://hdl.handle.net/10919/114434en
dc.language.isoenen
dc.publisherVirginia Polytechnic Institute and State Universityen
dc.relation.isformatofOCLC# 34347974en
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subject.lccLD5655.V856 1995.P36en
dc.titleDry etching processes for ferroelectric capacitorsen
dc.typeDissertationen
dc.type.dcmitypeTexten
thesis.degree.disciplineMaterials Engineering Scienceen
thesis.degree.grantorVirginia Polytechnic Institute and State Universityen
thesis.degree.leveldoctoralen
thesis.degree.namePh.D.en

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