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Gas Separation Silica Membranes Prepared by Chemical Vapor Deposition of Methyl-Substituted Silanes

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dc.contributor.authorKato, Harumien
dc.contributor.authorLundin, Sean-Thomas B.en
dc.contributor.authorAhn, So-Jinen
dc.contributor.authorTakagaki, Atsushien
dc.contributor.authorKikuchi, Ryujien
dc.contributor.authorOyama, Shigeo Teden
dc.contributor.departmentChemical Engineeringen
dc.date.accessioned2019-11-12T13:33:05Zen
dc.date.available2019-11-12T13:33:05Zen
dc.date.issued2019-11-03en
dc.date.updated2019-11-12T08:28:28Zen
dc.description.abstractThe effect on the gas permeance properties and structural morphology of the presence of methyl functional groups in a silica membrane was studied. Membranes were synthesized via chemical vapor deposition (CVD) at 650 &deg;C and atmospheric pressure using three silicon compounds with differing numbers of methyl- and methoxy-functional groups: tetramethyl orthosilicate (TMOS), methyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time of the silica precursors in the CVD process was adjusted for each precursor and optimized in terms of gas permeance and ideal gas selectivity criteria. Final H<sub>2</sub> permeances at 600 &deg;C for the TMOS-, MTMOS-, and DMDMOS-derived membranes were respectively 1.7 &times; 10<sup>&minus;7</sup>, 2.4 &times; 10<sup>&minus;7</sup>, and 4.4 &times; 10<sup>&minus;8</sup> mol∙m<sup>&minus;2</sup>∙s<sup>&minus;1</sup>∙Pa<sup>&minus;1</sup> and H<sub>2</sub>/N<sub>2</sub> selectivities were 990, 740, and 410. The presence of methyl groups in the membranes fabricated with the MTMOS and DMDMOS precursors was confirmed via Fourier-transform infrared (FTIR) spectroscopy. From FTIR analysis, an increasing methyl signal in the silica structure was correlated with both an improvement in the hydrothermal stability and an increase in the apparent activation energy for hydrogen permeation. In addition, the permeation mechanism for several gas species (He, H<sub>2</sub>, Ne, CO<sub>2</sub>, N<sub>2</sub>, and CH<sub>4</sub>) was determined by fitting the gas permeance temperature dependence to one of three models: solid state, gas-translational, or surface diffusion.en
dc.description.versionPublished versionen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationKato, H.; Lundin, S.-T.B.; Ahn, S.-J.; Takagaki, A.; Kikuchi, R.; Oyama, S.T. Gas Separation Silica Membranes Prepared by Chemical Vapor Deposition of Methyl-Substituted Silanes. Membranes 2019, 9, 144.en
dc.identifier.doihttps://doi.org/10.3390/membranes9110144en
dc.identifier.urihttp://hdl.handle.net/10919/95497en
dc.language.isoenen
dc.publisherMDPIen
dc.rightsCreative Commons Attribution 4.0 Internationalen
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en
dc.subjectsilica-based membraneen
dc.subjecthydrogen separationen
dc.subjectCVDen
dc.subjectpore size controlen
dc.subjecttetramethyl orthosilicateen
dc.subjectmethyltrimethoxysilaneen
dc.subjectdimethyldimethoxysilaneen
dc.subjectseparation mechanismen
dc.titleGas Separation Silica Membranes Prepared by Chemical Vapor Deposition of Methyl-Substituted Silanesen
dc.title.serialMembranesen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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