Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation
| dc.contributor.author | Mise, Yoshihiro | en |
| dc.contributor.author | Ahn, So-Jin | en |
| dc.contributor.author | Takagaki, Atsushi | en |
| dc.contributor.author | Kikuchi, Ryuji | en |
| dc.contributor.author | Oyama, Shigeo Ted | en |
| dc.contributor.department | Chemical Engineering | en |
| dc.date.accessioned | 2019-09-23T14:16:34Z | en |
| dc.date.available | 2019-09-23T14:16:34Z | en |
| dc.date.issued | 2019-09-20 | en |
| dc.date.updated | 2019-09-23T13:49:42Z | en |
| dc.description.abstract | Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H<sub>2</sub> permeance of 8.3 × 10<sup>−7</sup> mol m<sup>−2</sup> s<sup>−1</sup> Pa<sup>−1</sup> with H<sub>2</sub>/CH<sub>4</sub> selectivity of 140 and H<sub>2</sub>/C<sub>2</sub>H<sub>6</sub> selectivity of 180 at 300 °C. Fourier transform infrared (FTIR) measurements indicated existence of methyl groups at high preparation temperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derived membranes than of a pure TEOS-derived membrane. Temperature-dependence measurements of the permeance of various gas species were used to establish a permeation mechanism. It was found that smaller species (He, H<sub>2</sub>, and Ne) followed a solid-state diffusion model while larger species (N<sub>2</sub>, CO<sub>2</sub>, and CH<sub>4</sub>) followed a gas translational diffusion model. | en |
| dc.description.version | Published version | en |
| dc.format.mimetype | application/pdf | en |
| dc.identifier.citation | Mise, Y.; Ahn, S.-J.; Takagaki, A.; Kikuchi, R.; Oyama, S.T. Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation. Membranes 2019, 9, 123. | en |
| dc.identifier.doi | https://doi.org/10.3390/membranes9100123 | en |
| dc.identifier.uri | http://hdl.handle.net/10919/93973 | en |
| dc.language.iso | en | en |
| dc.publisher | MDPI | en |
| dc.rights | Creative Commons Attribution 4.0 International | en |
| dc.rights.uri | http://creativecommons.org/licenses/by/4.0/ | en |
| dc.subject | silica-based membrane | en |
| dc.subject | hydrogen separation | en |
| dc.subject | CVD | en |
| dc.subject | pore size control | en |
| dc.subject | trimethylmethoxisilane | en |
| dc.subject | separation mechanism | en |
| dc.title | Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation | en |
| dc.title.serial | Membranes | en |
| dc.type | Article - Refereed | en |
| dc.type.dcmitype | Text | en |