Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle

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dc.contributor.authorMellert, Karolinen
dc.contributor.departmentApplied opticsen
dc.date.accessioned2016-06-27T19:03:40Zen
dc.date.available2016-06-27T19:03:40Zen
dc.date.issued2002-12en
dc.description.abstractMultiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography.en
dc.format.mimetypeapplication/pdfen
dc.identifiereprint:275en
dc.identifier.urihttp://hdl.handle.net/10919/71551en
dc.language.isodeen
dc.publisherRheinische Friedrich-Wilhelms-Universität Bonnen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectphotonic crystalen
dc.subjectinterferenceen
dc.subjectlithographyen
dc.subjectSimulationen
dc.subjectmetalen
dc.subjectgolden
dc.subjectplasmonen
dc.subjectS1805en
dc.subjectShipleyen
dc.subjectpositive photoresisten
dc.subject.lccQCen
dc.titleAufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalleen
dc.typeThesisen
thesis.degree.grantorUniversity of Bonn, Germanyen
thesis.degree.levelmastersen

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