Photoemission and low-energy-electron-diffraction study of clean and oxygen-dosed Cu₂O (111) and (100) surfaces

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dc.contributorVirginia Techen
dc.contributor.authorSchulz, Kirk H.en
dc.contributor.authorCox, David F.en
dc.contributor.departmentChemical Engineeringen
dc.date.accessed2014-04-23en
dc.date.accessioned2014-05-07T15:37:03Zen
dc.date.available2014-05-07T15:37:03Zen
dc.date.issued1991-01-01en
dc.description.abstractThe geometric and electronic structure of clean and oxygen-dosed Cu₂O single-crystal surfaces was studied with x-ray and ultraviolet photoelectron (UPS) spectroscopies and low-energy electron diffraction. The nonpolar (111) surface can be prepared in a nearly stoichiometric (1×1) form by ion bombardment and annealing in vacuum. Oxygen adsorbs molecularly on the stoichiometric (111) surface at 300 K, but adsorbs dissociatively on a defective (111) surface prepared by ion bombardment. For the polar Cu₂O(100) face it was possible to prepare a reconstructed, Cu-terminated surface with a (3√2×√2)R45° periodicity by ion bombardment and annealing in vacuum. Preparation of an unreconstructed, (1×1), O-terminated (100) surface was possible by large (10⁹-L) oxygen exposures. UPS investigations of the O-terminated (100) surface suggest a mixture of incorporated (i.e., lattice) oxygen and adsorbed atomic oxygen (i.e., adatoms) in the terminating layer. The annealing behavior of the Cu₂O(100) surface was history dependent. Early in the sample history, bulk lattice oxygen diffused to the surface at temperatures above 800 K giving domains of (square-root 2×√2)R45° periodicity associated with half a terminating layer of oxygen atoms. After repeated ion bombardment and annealing cycles, heating above 800 K gave only a Cu-terminated surface, apparently because of a depletion of bulk lattice oxygen.en
dc.description.sponsorshipNSF Grant No. CBT- 870876en
dc.description.sponsorshipDonors of The Petroleum Research Fund, administered by the American Chemical Societyen
dc.format.mimetypeapplication/pdfen
dc.identifier.citationSchulz, K. H.; Cox, D. F., "Photoemission and low-energy-electron-diffraction study of clean and oxygen-dosed Cu2O (111) and (100) surfaces," Phys. Rev. B 43, 1610 DOI: http://dx.doi.org/10.1103/PhysRevB.43.1610en
dc.identifier.doihttps://doi.org/10.1103/PhysRevB.43.1610en
dc.identifier.issn0163-1829en
dc.identifier.urihttp://hdl.handle.net/10919/47873en
dc.identifier.urlhttp://journals.aps.org/prb/abstract/10.1103/PhysRevB.43.1610en
dc.language.isoen_USen
dc.publisherAmerican Physical Societyen
dc.rightsIn Copyrighten
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subjectCopper surfacesen
dc.subjectAdsorptionen
dc.subjectCuOen
dc.subjectStabilityen
dc.subjectXPSen
dc.subjectAESen
dc.subjectPhysicsen
dc.subjectCondensed matteren
dc.titlePhotoemission and low-energy-electron-diffraction study of clean and oxygen-dosed Cu₂O (111) and (100) surfacesen
dc.title.serialPhysical Review Ben
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten

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