Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor
| dc.contributor.author | Oyama, Shigeo Ted | en |
| dc.contributor.author | Aono, Haruki | en |
| dc.contributor.author | Takagaki, Atsushi | en |
| dc.contributor.author | Sugawara, Takashi | en |
| dc.contributor.author | Kikuchi, Ryuji | en |
| dc.contributor.department | Chemical Engineering | en |
| dc.date.accessioned | 2020-03-27T18:47:58Z | en |
| dc.date.available | 2020-03-27T18:47:58Z | en |
| dc.date.issued | 2020-03-22 | en |
| dc.date.updated | 2020-03-27T13:24:04Z | en |
| dc.description.abstract | Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate γ-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the γ-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H<sub>2</sub> selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H<sub>2</sub> permeance > 10<sup>−7</sup> mol m<sup>−2</sup> s<sup>−1</sup> Pa<sup>−1</sup> and H<sub>2</sub>/N<sub>2</sub> selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H<sub>2</sub> permeance without compromising the H<sub>2</sub>/N<sub>2</sub> selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes. | en |
| dc.description.version | Published version | en |
| dc.format.mimetype | application/pdf | en |
| dc.identifier.citation | Oyama, S.T.; Aono, H.; Takagaki, A.; Sugawara, T.; Kikuchi, R. Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor. Membranes 2020, 10, 50. | en |
| dc.identifier.doi | https://doi.org/10.3390/membranes10030050 | en |
| dc.identifier.uri | http://hdl.handle.net/10919/97499 | en |
| dc.language.iso | en | en |
| dc.publisher | MDPI | en |
| dc.rights | Creative Commons Attribution 4.0 International | en |
| dc.rights.uri | http://creativecommons.org/licenses/by/4.0/ | en |
| dc.subject | silica-alumina membrane | en |
| dc.subject | dimethyldimethoxysilane (DMDMOS) | en |
| dc.subject | hydrothermal stability | en |
| dc.subject | chemical vapor deposition | en |
| dc.subject | gamma-alumina intermediate layers | en |
| dc.subject | hydrogen helium separation | en |
| dc.title | Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor | en |
| dc.title.serial | Membranes | en |
| dc.type | Article - Refereed | en |
| dc.type.dcmitype | Text | en |
| dc.type.dcmitype | StillImage | en |