A model for a Langmuir sheath in a stagnating dense plasma with secondary ion formation
dc.contributor.author | Martin, Christopher R. | en |
dc.contributor.author | Untaroiu, Alexandrina | en |
dc.contributor.author | Rahman, S. M. Mahbobur | en |
dc.date.accessioned | 2025-01-24T18:02:29Z | en |
dc.date.available | 2025-01-24T18:02:29Z | en |
dc.date.issued | 2024-04-24 | en |
dc.description.abstract | This simplified model provides solutions for the current-voltage characteristics of a sheath in a dense flowing plasma when surface chemistry contributes secondary ions. The problem is motivated by the recent discovery that strong transient signals in industrial ion current sensors are caused by chemical reactions with carbon in the steel being cut or welded by oxyfuel processes. The one-dimensional model considers a quasi-uniform dense plasma flowing towards and stagnating on an absorbing surface, above which there is a source of secondary ions. Because the secondary ions are formed directly in the plasma sheath, they have strong impacts on the current-voltage characteristic. With ionic Reynolds number, R, and integral length scale, α, secondary ion formation rate, Ω, and length scale, β, saturation currents are simply R + βΩ until β ≪ 1, at which point, new electrons cannot escape the sheath, and secondary ions have no effect. Floating potential, ϕ ∞, scales like exp ( ϕ ∞ ) ∝ R − 3 / 4 , and secondary ions have little impact unless β 2Ω > 1. Even then, floating potential is only weakly affected by secondary ion formation. The integral length scale, α, is not found to strongly affect the results. | en |
dc.description.version | Published version | en |
dc.format.extent | 13 page(s) | en |
dc.format.mimetype | application/pdf | en |
dc.identifier | ARTN 055609 (Article number) | en |
dc.identifier.doi | https://doi.org/10.1088/1402-4896/ad37db | en |
dc.identifier.eissn | 1402-4896 | en |
dc.identifier.issn | 0031-8949 | en |
dc.identifier.issue | 5 | en |
dc.identifier.orcid | Rahman, S M Mahbobur [0000-0003-2112-4929] | en |
dc.identifier.orcid | Untaroiu, Alexandrina [0000-0002-5383-8363] | en |
dc.identifier.uri | https://hdl.handle.net/10919/124370 | en |
dc.identifier.volume | 99 | en |
dc.language.iso | en | en |
dc.publisher | IOP Publishing | en |
dc.rights | Creative Commons Attribution 4.0 International | en |
dc.rights.uri | http://creativecommons.org/licenses/by/4.0/ | en |
dc.subject | Sheath | en |
dc.subject | stagnation | en |
dc.subject | current-voltage characteristic | en |
dc.subject | chemions | en |
dc.title | A model for a Langmuir sheath in a stagnating dense plasma with secondary ion formation | en |
dc.title.serial | Physica Scripta | en |
dc.type | Article - Refereed | en |
dc.type.dcmitype | Text | en |
dc.type.other | Article | en |
dc.type.other | Journal | en |
pubs.organisational-group | Virginia Tech | en |
pubs.organisational-group | Virginia Tech/Engineering | en |
pubs.organisational-group | Virginia Tech/Engineering/Mechanical Engineering | en |
pubs.organisational-group | Virginia Tech/Faculty of Health Sciences | en |
pubs.organisational-group | Virginia Tech/All T&R Faculty | en |
pubs.organisational-group | Virginia Tech/Engineering/COE T&R Faculty | en |
pubs.organisational-group | Virginia Tech/Graduate students | en |
pubs.organisational-group | Virginia Tech/Graduate students/Doctoral students | en |