A model for a Langmuir sheath in a stagnating dense plasma with secondary ion formation

dc.contributor.authorMartin, Christopher R.en
dc.contributor.authorUntaroiu, Alexandrinaen
dc.contributor.authorRahman, S. M. Mahboburen
dc.date.accessioned2025-01-24T18:02:29Zen
dc.date.available2025-01-24T18:02:29Zen
dc.date.issued2024-04-24en
dc.description.abstractThis simplified model provides solutions for the current-voltage characteristics of a sheath in a dense flowing plasma when surface chemistry contributes secondary ions. The problem is motivated by the recent discovery that strong transient signals in industrial ion current sensors are caused by chemical reactions with carbon in the steel being cut or welded by oxyfuel processes. The one-dimensional model considers a quasi-uniform dense plasma flowing towards and stagnating on an absorbing surface, above which there is a source of secondary ions. Because the secondary ions are formed directly in the plasma sheath, they have strong impacts on the current-voltage characteristic. With ionic Reynolds number, R, and integral length scale, α, secondary ion formation rate, Ω, and length scale, β, saturation currents are simply R + βΩ until β ≪ 1, at which point, new electrons cannot escape the sheath, and secondary ions have no effect. Floating potential, ϕ ∞, scales like exp ( ϕ ∞ ) ∝ R − 3 / 4 , and secondary ions have little impact unless β 2Ω > 1. Even then, floating potential is only weakly affected by secondary ion formation. The integral length scale, α, is not found to strongly affect the results.en
dc.description.versionPublished versionen
dc.format.extent13 page(s)en
dc.format.mimetypeapplication/pdfen
dc.identifierARTN 055609 (Article number)en
dc.identifier.doihttps://doi.org/10.1088/1402-4896/ad37dben
dc.identifier.eissn1402-4896en
dc.identifier.issn0031-8949en
dc.identifier.issue5en
dc.identifier.orcidRahman, S M Mahbobur [0000-0003-2112-4929]en
dc.identifier.orcidUntaroiu, Alexandrina [0000-0002-5383-8363]en
dc.identifier.urihttps://hdl.handle.net/10919/124370en
dc.identifier.volume99en
dc.language.isoenen
dc.publisherIOP Publishingen
dc.rightsCreative Commons Attribution 4.0 Internationalen
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en
dc.subjectSheathen
dc.subjectstagnationen
dc.subjectcurrent-voltage characteristicen
dc.subjectchemionsen
dc.titleA model for a Langmuir sheath in a stagnating dense plasma with secondary ion formationen
dc.title.serialPhysica Scriptaen
dc.typeArticle - Refereeden
dc.type.dcmitypeTexten
dc.type.otherArticleen
dc.type.otherJournalen
pubs.organisational-groupVirginia Techen
pubs.organisational-groupVirginia Tech/Engineeringen
pubs.organisational-groupVirginia Tech/Engineering/Mechanical Engineeringen
pubs.organisational-groupVirginia Tech/Faculty of Health Sciencesen
pubs.organisational-groupVirginia Tech/All T&R Facultyen
pubs.organisational-groupVirginia Tech/Engineering/COE T&R Facultyen
pubs.organisational-groupVirginia Tech/Graduate studentsen
pubs.organisational-groupVirginia Tech/Graduate students/Doctoral studentsen

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