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dc.contributor.authorDietrich, Frank E.en_US
dc.date.accessioned2014-03-14T21:38:19Z
dc.date.available2014-03-14T21:38:19Z
dc.date.issued1977-06-15en_US
dc.identifier.otheretd-06122010-020211en_US
dc.identifier.urihttp://hdl.handle.net/10919/43235
dc.description.abstractsee documenten_US
dc.format.mediumBTDen_US
dc.publisherVirginia Techen_US
dc.relation.haspartLD5655.V855_1977.D54.pdfen_US
dc.subjectfilm structuresen_US
dc.subject.lccLD5655.V855 1977.D54en_US
dc.titleAn X-ray study of the behavior of titanium films on silicon substratesen_US
dc.typeThesisen_US
dc.contributor.departmentMetallurgical Engineeringen_US
dc.description.degreeMaster of Scienceen_US
thesis.degree.nameMaster of Scienceen_US
thesis.degree.levelmastersen_US
thesis.degree.grantorVirginia Polytechnic Institute and State Universityen_US
thesis.degree.disciplineMetallurgical Engineeringen_US
dc.contributor.committeechairHouska, Charles R.en_US
dc.contributor.committeememberHibbard, W. R. Jr.en_US
dc.contributor.committeememberFloridis, T. P.en_US
dc.contributor.committeememberLytton, Jack L.en_US
dc.identifier.sourceurlhttp://scholar.lib.vt.edu/theses/available/etd-06122010-020211/en_US
dc.date.sdate2010-06-12en_US
dc.date.rdate2010-06-12
dc.date.adate2010-06-12en_US


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